BCl3/Ar plasma etching for the performance enhancement of Al-doped ZnO thin films-Reference-Cited by-同舟云学术

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BCl3/Ar plasma etching for the performance enhancement of Al-doped ZnO thin films

Published:2021-09 Issue: Volume:561 Page:149957
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Joo Young-Hee,Jin Mi-Jin,Kim Sung Kyun,Um Doo-Seung,Kim Chang-Il

Funder

National Research Foundation of Korea

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference35 articles.

1. Nanometre-thin indium tin oxide for advanced high-performance electronics;Li;Nat. Mater.,2019

2. Flexible two-dimensional indium tin oxide fabricated using a liquid metal printing technique;Datta;Nat. Electron.,2020

3. Electrical, optical, and structural properties of indium-tin-oxide thin films for organic light-emitting devices;Kim;J. Appl. Phys.,1999

4. Surface characterization of transparent conductive oxide Al-doped ZnO films;Chen;J. Cryst. Growth,2000

5. Present status of transparent conducting oxide ing oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes;Minami;Thin Solid Films,2008

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4. Work Function: Fundamentals, Measurement, Calculation, Engineering, and Applications;Physical Review Applied;2023-03-22

5. Systematic investigations on morphological properties of aluminum-doped zinc oxide transparent electrode prepared from pulsed laser deposition and its electrochromic application;Vacuum;2023-03

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