Reaction mechanisms of chlorine reduction on hydroxylated alumina in titanium nitride growth: First principles study-Reference-Cited by-同舟云学术

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Reaction mechanisms of chlorine reduction on hydroxylated alumina in titanium nitride growth: First principles study

Published:2021-06 Issue: Volume:550 Page:149391
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Choi Woojin,Lee Sungwoo,Han Dong-Hoon,Lim Hong Taek,Park Hwanyeol,Lee Gun-Do

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference38 articles.

1. High-κ gate dielectrics: current status and materials properties considerations;Wilk;J. Appl. Phys.,2001

2. Surface coating on aluminum flakes with titanium nitride layer by barrel-sputtering techniques;Akamaru;Mater. Trans.,2008

3. Microstructure and electrochemical properties of PVD TiN, (Ti, Al) N-coated Ti-based bulk metallic glasses;Qin;Mater. Trans.,2009

4. Microstructure and preferred orientation of titanium nitride films prepared by laser CVD;Gong;Mater. Trans.,2009

5. Preparation and characterization of CVD-TiN-coated carbon fibers for applications in metal matrix composites;Abidin;Thin Solid Films,2015

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1. First-Principles computation-driven mechanism study of tungsten growth on alumina surfaces with TiN nano-islands;Applied Surface Science;2024-11

2. Reaction mechanism of plasma spraying TiO2-Al system and formation mechanism of the coating;Journal of the European Ceramic Society;2024-01

3. First-Principles Computation-Driven Mechanism Study of Tungsten Growth on Alumina Surfaces with Tin Nano-Islands;2024

4. The Mechanism of Growing MoS₂ via Sulfuration of Molybdenum Hexacarbonyl: First principles study;ChemistrySelect;2023-04-07

5. Fluorination of TiN, TiO2, and SiO2 Surfaces by HF toward Selective Atomic Layer Etching (ALE);Coatings;2023-02-08

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