Electron-assisted chemical etching of oxidized chromium

Author:

Sun Y.-M.,Wang S.,White J.M.,Stivers A.,Liang T.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference15 articles.

1. Progress in extreme ultraviolet mask repair using a focused ion beam

2. Second International Symposium on 157nm Lithography;Liang,2001

3. 21st Annual BACUS Symposium on Photomask Technology, Monterey, Proceedings of SPIE, vol. 4562;Liang,2002

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3. Gas-assisted focused electron beam and ion beam processing and fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008

4. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching;Critical Reviews in Solid State and Materials Sciences;2006-09

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