Sub-micron ZnO:N particles fabricated by low voltage electrical discharge lithography on Zn3N2 sputtered films-Reference-Cited by-同舟云学术

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Sub-micron ZnO:N particles fabricated by low voltage electrical discharge lithography on Zn3N2 sputtered films

Published:2013-11 Issue: Volume:285 Page:783-788
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Núñez C. García,Jiménez-Trillo J.,Vélez M. García,Piqueras J.,Pau J.L.,Coya C.,Álvarez A.L.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference38 articles.

1. Über die Kristallstrukturen von Zn3N2, Cd3N2 und Ge3N4. Metallamide und metallnitride. IX. Mitteilung;Juza;Anorg. Allg. Chem.,1940

2. Optical band gap of Zn3N2 films;Kuriyama;Phys. Rev. B,1993

3. The crystal structures of Mg3N2 and Zn3N2;Partin;J. Solid State Chem.,1997

4. Structural, electrical and optical properties of zinc nitride thin films prepared by reactive rf magnetron sputtering;Futsuhara;Thin Solid Films,1997

5. MOCVD of the cubic zinc nitride phase, Zn3N2, using Zn[N(SiMe3)2]2 and ammonia as precursors;Maile;Chem. Vapor Depos.,2005

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Improved ambient stability of thermally annealed zinc nitride thin films;AIP Advances;2020-03-01

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