In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution-Reference-Cited by-同舟云学术

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In-situ XRD vs ex-situ vacuum annealing of tantalum oxynitride thin films: Assessments on the structural evolution

Published:2018-04 Issue: Volume:438 Page:14-19
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cunha L.,Apreutesei M.,Moura C.,Alves E.,Barradas N.P.,Cristea D.

Funder

Portuguese Foundation for Science and Technology

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference20 articles.

1. The effect of vacuum annealing on the microstructure, mechanical and electrical properties of tantalum films

2. The impact of substrate properties and thermal annealing on tantalum nitride thin films

3. Microstructure and mechanical properties of sputter deposited tantalum nitride thin films after high temperature loading

4. Characteristics of tantalum nitride thin film strain gauges for harsh environments

5. High-temperature ceramic pressure sensor

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1. A stable and plug-and-play aluminium/titanium dioxide/metal-organic framework/silver composite sheet for sensitive Raman detection and photocatalytic removal of 4-aminothiophenol;Chemosphere;2021-11

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