A pressure tuned stop-flow atomic layer deposition process for MoS2 on high porous nanostructure and fabrication of TiO2/MoS2 core/shell inverse opal structure-Reference-Cited by-同舟云学术

A pressure tuned stop-flow atomic layer deposition process for MoS2 on high porous nanostructure and fabrication of TiO2/MoS2 core/shell inverse opal structure

Published:2017-11 Issue: Volume:422 Page:536-543
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Li Xianglin,Puttaswamy Manjunath,Wang Zhiwei,Kei Tan Chiew,Grimsdale Andrew C.,Kherani Nazir P.,Tok Alfred Iing Yoong

Funder

Singapore Ministry of Education Tier 2 Academic Research Fund

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference40 articles.

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4. MoS2/CdS nanosheets-on-nanorod heterostructure for highly efficient photocatalytic H2 generation under visible light irradiation;Yin;ACS Appl. Mater. Interfaces,2016

5. Chemically exfoliated metallic MoS2 nanosheets: a promising supporting co-catalyst for enhancing the photocatalytic performance of TiO2 nanocrystals;Bai;Nano Res.,2015

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