XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition-Reference-Cited by-同舟云学术

XPS analysis of AlN thin films deposited by plasma enhanced atomic layer deposition

Published:2014-10 Issue: Volume:315 Page:104-109
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Motamedi P.,Cadien K.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

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