Sputter yields of rough surfaces: Importance of the mean surface inclination angle from nano- to microscopic rough regimes-Reference-Cited by-同舟云学术

Sputter yields of rough surfaces: Importance of the mean surface inclination angle from nano- to microscopic rough regimes

Published:2021-12 Issue: Volume:570 Page:151204
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Cupak C.^ORCID,Szabo P.S.^ORCID,Biber H.^ORCID,Stadlmayr R.^ORCID,Grave C.,Fellinger M.,Brötzner J.^ORCID,Wilhelm R.A.^ORCID,Möller W.,Mutzke A.,Moro M.V.^ORCID,Aumayr F.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference58 articles.

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4. The deposition and microstructure of amorphous tungsten oxide films by sputtering;Li;Vacuum,2015

5. An improved FIB sample preparation technique for site-specific plan-view specimens: A new cutting geometry;Li;Ultramicroscopy,2018

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