Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements-Reference-Cited by-同舟云学术

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Laser patterning of SiOx-layers for the fabrication of UV diffractive phase elements

Published:2005-07 Issue:1-4 Volume:248 Page:190-195
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Schulz-Ruhtenberg Malte,Ihlemann Jürgen,Heber Jörg

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference16 articles.

1. Pulsed laser deposition: a new technique for deposition of amorphous SiO thin films

2. Excimer laser micromachining for rapid fabrication of diffractive optical elements

3. Rapid fabrication of diffractive optical elements by use of image-based excimer laser ablation

4. Rapid prototyping of diffractive optical elements for high-power lasers using laser ablation lithography fabrication and coherence probe microscopy analysis

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3. Fabrication of Periodic Nanostructures on Silicon Suboxide Films with Plasmonic Near-Field Ablation Induced by Low-Fluence Femtosecond Laser Pulses;Nanomaterials;2020-07-30

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