Growth feature of ionic nitrogen doped CNx bilayer films with Ti and TiN interlayer by pulse cathode arc discharge-Reference-Cited by-同舟云学术

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Growth feature of ionic nitrogen doped CNx bilayer films with Ti and TiN interlayer by pulse cathode arc discharge

Published:2016-01 Issue: Volume:361 Page:169-176
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhou Bing,Liu Zhubo,Piliptsou D.G.,Rogachev A.V.,Yu Shengwang,Wu Yanxia,Tang Bin,Rudenkov A.S.

Funder

Qualified Personnel Foundation

Special/Young Foundation

National Natural Science Foundation of China

Shanxi Provincial Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference33 articles.

1. Role of nitrogen in the formation of hard and elastic CNx thin films by reactive magnetron sputtering;Hellgren;Phys. Rev. B: Condens. Matter,1999

2. Powder synthesis and characterization of amorphous carbon nitride;Khabashesku;Chem. Mater.,2000

3. Role of nitrogen in evolution of sp2/sp3 bonding and optical band gap in hydrogenated carbon nitride;Majumdar;Vib. Spectrosc.,2013

4. Microstructure and mechanical properties of carbon nitride multilayer films deposited by DC magnetron sputtering;Liu;Surf. Coat. Technol.,2011

5. Prediction of new low compressibility solids;Liu;Science,1989

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