Reactive ion etching of FePt using inductively coupled plasma-Reference-Cited by-同舟云学术

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Reactive ion etching of FePt using inductively coupled plasma

Published:2008-09 Issue:23 Volume:254 Page:7918-7920
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kanazawa Tomomi,Ono Kohei,Takenaka Masato,Yamazaki Masashi,Masuda Kenichi,Cho Shiho,Wakayama Takayuki,Takano Fumiyoshi,Akinaga Hiro

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference15 articles.

1. Giant room-temperature magnetoresistance in single-crystal Fe/MgO/Fe magnetic tunnel junctions

2. Current-Driven Magnetization Switching in CoFeB/MgO/CoFeB Magnetic Tunnel Junctions

3. Ultramicro fabrications on Fe-Ni alloys using electron-beam writing and reactive-ion etching

4. High density plasma etching of NiFe, NiFeCo and NiMnSb-based multilayers for magnetic storage elements

5. Etching characteristics of magnetic materials (Co, Fe, Ni) using CO/NH3 gas plasma for hardening mask etching

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deposition and patterning of magnetic atom trap lattices in FePt films with periods down to 200 nm;Journal of Applied Physics;2018-07-28

2. Investigation on etch characteristics of FePt thin films using a H2O/Ar plasma;Microelectronic Engineering;2013-08

3. Arrays of ordered nanostructures in Fe-Pt thin films by self-assembling of polystyrene nanospheres;Journal of Applied Physics;2013-05-07

4. Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O2/Ar plasma;Thin Solid Films;2012-12

5. Etch characteristics of FePt magnetic thin films using inductively coupled plasma reactive ion etching;Thin Solid Films;2011-09

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