Phase transition in sputtered HfO2 thin films: A qualitative Raman study

Author:

Belo G.S.,Nakagomi F.,Minko A.,da Silva S.W.,Morais P.C.,Buchanan D.A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference27 articles.

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3. Physical Characterization of Ultrathin Films of High Dielectric Constant Materials on Silicon;Gusev,2000

4. Reliability and integration of ultra-thin gate dielectrics for advanced CMOS

5. Growth, Characterization and the Limits of Ultrathin SiO2-based Dielectrics for Future CMOS Applications;Buchanan,1996

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