Effect of negative substrate bias on the microstructure and mechanical properties of Ti–Si–N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique-Reference-Cited by-同舟云学术

Effect of negative substrate bias on the microstructure and mechanical properties of Ti–Si–N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique

Published:2012-07 Issue:18 Volume:258 Page:6897-6901
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Zhang Yujuan,Yang Yingze,Zhai Yuhao,Zhang Pingyu

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference37 articles.

1. A concept for the design of novel superhard coatings

2. Structural properties, internal stress and thermal stability of nc-TiN/a-Si3N4, nc-TiN/TiSix and nc-(Ti1−yAlySix)N superhard nanocomposite coatings reaching the hardness of diamond

3. Thermal stability of superhard nanocomposite coatings consisting of immiscible nitrides

4. Influence of Si content and growth condition on the microstructure and mechanical properties of Ti–Si–N nanocomposite films

5. A study of structural and mechanical properties of sputter deposited nanocomposite Ti–Si–N thin films

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