Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Effects of pulse bias on structure and properties of silicon/nitrogen-incorporated diamond-like carbon films prepared by plasma-enhanced chemical vapor deposition

Published:2013-01 Issue: Volume:264 Page:625-632
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Nakazawa Hideki,Miura Soushi,Kamata Ryosuke,Okuno Saori,Suemitsu Maki,Abe Toshimi

Funder

Scientific Research from the Ministry of Education, Culture, Sports, Science and Technology of Japan

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference45 articles.

1. Improved high-temperature stability of Si incorporated a-C:H films

2. Tribological properties and characterization of diamond-like carbon coatings with silicon prepared by plasma-assisted chemical vapour deposition

3. Tribology of carbonaceous films formed by ion-beam- assisted deposition of organic material

4. Tribological behavior of silicon-incorporated diamond-like carbon films

5. Tribological properties and characterization of DLC films deposited by pulsed bias CVD

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