Novel type of indium oxide thin films sputtering for opto-electronic applications-Reference-Cited by-同舟云学术

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Novel type of indium oxide thin films sputtering for opto-electronic applications

Published:2007-05 Issue:15 Volume:253 Page:6608-6611
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Golan G.,Axelevitch A.,Gorenstein B.,Peled A.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference13 articles.

1. Characterization of low-resistivity indium oxide films by Auger electron spectroscopy, X-ray photoelectron spectroscopy, and X-ray diffraction and correlation between their properties, composition, and texture;Jeong;J. Vacuum Sci. Technol. A,1998

2. InOx nanostructured thin films: electrical and sensing characterization;Kiriakidis;Rev. Adv. Mater. Sci.,2003

3. Direct current magnetron sputtered In2O3 films as tunnel barriers;Kasiviswanathan;J. Appl. Phys.,1994

4. Photoelectric properties of ITO/p +-p −-InP solar cells in linearly polarized light;Botnaryuk;Zh. Tekh. Fiz.,1998

5. Characterization of transparent and conductive electrodes of indium tin oxide thin films by sequential reactive evaporation;Penza;Thin Solid Films,1999

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