Investigations on the oxidation of zirconium nitride films in air by nuclear reaction analysis and backscattering spectrometry-Reference-Cited by-同舟云学术

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Investigations on the oxidation of zirconium nitride films in air by nuclear reaction analysis and backscattering spectrometry

Published:2007-06 Issue:17 Volume:253 Page:7230-7237
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Reddy G.L.N.,Ramana J.V.,Kumar Sanjiv,Kumar S. Vikram,Raju V.S.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference26 articles.

1. Thermal oxidation of sputtered TiN diffusion barriers

2. Oxidation of thin CrN and Cr2N films analyzed via nuclear reaction analysis and Rutherford backscattering spectrometry

3. Thermal stability of nitride thin films

4. Oxidation kinetics of ZrN thin films

5. The degradation of TiN films on Cu substrates at high temperature under controlled atmosphere

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