1. Photoresist: materials and process;De Forest,1979
2. Burga RA. RadTech Europe Conf Proc, 425, Lyon (France), 1997.
3. Eranian A. Eur. COMETT, Le Mans (France), 1995.
4. Finter J, Frischinger I, Haug T, Marton R. RadTech Europe Conf Proc, 489, Lyon (France), 1997.