1. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance;Lee,2004
2. 10nm three-dimensional CD-SEM metrology;Vladár,2014
3. ITRS International Technology Roadmap for Semiconductors,2016
4. Comprehensive simulation of SEM images taking into account local and global electromagnetic fields;Babin,2010
5. Monte Carlo modeling of secondary electron imaging in three dimensions;Villarrubia,2007