UV-Ozone Cleaning for Removal of Surface Contaminants-Reference-Cited by-同舟云学术

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UV-Ozone Cleaning for Removal of Surface Contaminants

Published:2015 Issue: Volume: Page:71-104
ISSN:
Container-title:Developments in Surface Contamination and Cleaning
language:
Short-container-title:

Author:

Kohli Rajiv

Publisher

Elsevier

Reference216 articles.

1. The U.S. Solvent Cleaning Industry and the Transition to Non Ozone Depleting Substances;U.S. EPA,2004

2. Cleaning with Solvents;Durkee,2008

3. HCFC Phaseout Schedule;EPA,2012

4. Handbook of Silicon Wafer Cleaning Technology,2008

5. Handbook for Critical Cleaning,2011

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Cost-effective equipment for surface pre-treatment for cleaning and excitation of substrates in semiconductor technology;SN Applied Sciences;2022-12-13

2. Inkjet-printed indium sulfide buffer layer for Cu(In,Ga)(S,Se)2 thin film solar cells;Thin Solid Films;2022-03

3. Sustainable, Renewable, and Biodegradable Poly(Lactic Acid) Fibers and Their Latest Developments in the Last Decade;Sustainable Textiles: Production, Processing, Manufacturing & Chemistry;2020

4. Removal of laser-induced contamination on ALADIN laser optics by UV/ozone cleaning;Laser-induced Damage in Optical Materials 2019;2019-11-20

5. Removal of carbon contamination on oxidation-prone metal-coated mirrors using atomic hydrogen;AIP Conference Proceedings;2019

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