Aqueous Cleaning and Surface Conditioning Processes-Reference-Cited by-同舟云学术

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Aqueous Cleaning and Surface Conditioning Processes

Published:2018 Issue: Volume: Page:185-252
ISSN:
Container-title:Handbook of Silicon Wafer Cleaning Technology
language:
Short-container-title:

Author:

Gale Glenn W.,Cui Hua,Reinhardt Karen A.

Publisher

Elsevier

Reference179 articles.

1. Carbonized layer formation in ion implanted photoresist masks

2. Handbook of Semiconductor Manufacturing Technology;Kern,2000

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Semiconductor Manufacturing: Cleanrooms, Wafer Cleaning, Gettering and Chip Yield;Integrated Circuit Fabrication;2023-11-16

2. New Quaternary Amines and Solvents for Photoresist Developing and Stripping Applications;Solid State Phenomena;2023-08-14

3. Detailed peak fitting analysis of the Ni 2p photoemission spectrum for metallic nickel and an initial oxidation;Journal of Electron Spectroscopy and Related Phenomena;2023-01

4. Stimuli-responsive Multilayers Based on Thiol Chemistry Controlling Adhesion and Growth of Fibroblasts;Bioceramics, Biomimetic and Other Compatible Materials Features for Medical Applications;2023

5. Metal Ion Doping of Alginate-Based Surface Coatings Induces Adipogenesis of Stem Cells;ACS Biomaterials Science & Engineering;2022-09-29

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