Advanced mask manufacturing-Reference-Cited by-同舟云学术

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Advanced mask manufacturing

Published:2006-10 Issue:8 Volume:7 Page:896-909
ISSN:1631-0705
Container-title:Comptes Rendus Physique
language:en
Short-container-title:Comptes Rendus Physique

Author:

Reita Carlo

Publisher

Elsevier BV

Subject

General Physics and Astronomy

Reference6 articles.

1. Photomask Fabrication Technology;Eynon,2005

2. SEMI standards SEMI-P1 to SEMI-P6 specify various mechanical and dimensional characteristics of masks. They are available via SEMI

3. Evaluation of new mask materials for improved lithography performance;Kasprowicz;Proc. SPIE,2001

4. SEMI P39-1105 OASIS—Open Artwork System Interchange Standard

5. Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node;Robert;Proc. SPIE,2005

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical Investigation of Deep Ultraviolet Degradation of Pellicles;Japanese Journal of Applied Physics;2010-05-20

2. The implementation of SCM concepts and information technology to the photomask supply management of IC companies;The International Journal of Advanced Manufacturing Technology;2009-10-29

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