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A photoelectron diffraction study of Cu{110}-(2×1)-O

  • Published:1990-03 Issue:3 Volume:227 Page:237-245
  • ISSN:0039-6028
  • Container-title:Surface Science
  • language:en
  • Short-container-title:Surface Science

Author:

Robinson A.W.,Somers J.S.,Ricken D.E.,Bradshaw A.M.,Kilcoyne A.L.D.,Woodruff D.P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 47 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Adsorbate structure determination using photoelectron diffraction: Methods and applications;Surface Science Reports;2007-01-01

2. Influence of O adsorbed on different surfaces of NixCu1－x on the segregation of Cu;Acta Physica Sinica;2005

3. The Adsorption of O Atom on Cu (100), (110), and (111) Low-Index and Step Defect Surfaces;The Journal of Physical Chemistry B;2003-05-30

4. Surface Structure Sensitivity of the Water−Gas Shift Reaction on Cu(hkl) Surfaces:  A Theoretical Study;The Journal of Physical Chemistry B;2002-12-12

5. Analysis of techniques to compare complex data sets;COMPEL - The international journal for computation and mathematics in electrical and electronic engineering;2002-12
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