Vibrational study of silicon oxidation: H2O on Si(100)-Reference-Cited by-同舟云学术

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Vibrational study of silicon oxidation: H2O on Si(100)

Published:1997-05 Issue:2-3 Volume:380 Page:444-454
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Struck L.M.,Eng J.,Bent B.E.,Flynn G.W.,Chabal Y.J.,Christman S.B.,Chaban E.E.,Raghavachari K.,Williams G.P.,Radermacher K.,Mantl S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference29 articles.

1. Dissociative chemisorption of H2O on Si(100) and Si(111) - a vibrational study

2. The interaction of water with solid surfaces: Fundamental aspects

3. Evidence of dissociation of water on the Si(100)2 × 1 surface

4. A comparative study of O2, H2 and H2O adsorption on Si(100)

5. Infrared reflection absorption Spectroscopy study of the chemisorption of small molecules (H2, O2 and H2O) on silicon

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