A generic approach of polishing metals via isotropic electrochemical etching-Reference-Cited by-同舟云学术

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A generic approach of polishing metals via isotropic electrochemical etching

Published:2020-03 Issue: Volume:150 Page:103517
ISSN:0890-6955
Container-title:International Journal of Machine Tools and Manufacture
language:en
Short-container-title:International Journal of Machine Tools and Manufacture

Author:

Yi Rong,Zhang Yi,Zhang Xinquan,Fang Fengzhou,Deng Hui

Funder

International Cooperation

Science and Technology Innovation Committee of Shenzhen Municipality, China

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Mechanical Engineering

Reference41 articles.

1. Mirror-like finishing by electrolyte jet machining;Kawanaka T;CIRP Ann. - Manuf. Technol.,2015

2. Plasma electrolytic polishing – an overview of applied technologies and current challenges to extend the polishable material range;Nestler;Procedia CIRP,2016

3. Abrasive fine-finishing technology;Hashimoto;CIRP Annal.,2016

4. A novel magnetically driven polishing technique for internal surface finishing;Zhang;Precis. Eng.,2018

5. A novel surface finishing technique for microparts using an optically controlled microparticle tool;Takaya;CIRP Ann. - Manuf. Technol.,2006

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