Analysis of GaAs using a combined r.f. glow discharge and inductively coupled plasma source mass spectrometer
Author:
Publisher
Elsevier BV
Subject
Spectroscopy
Reference20 articles.
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2. Jet-enhanced sputtering cell as an ion source for mass spectrometry
3. Design and characterization of glow discharge devices as complementary sources for an “ICP” mass spectrometer
4. Analysis of aluminium alloys using inductively coupled plasma and glow discharge mass spectrometry
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