H atom abstraction of D adsorbed on Si(100): dynamical evidence for an Eley-Rideal mechanism
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference31 articles.
1. Plasma Deposition of Amorphous Silicon-Based Materials;Bruno,1995
2. Beam investigations of D2 adsorption on Si(100): On the importance of lattice excitations in the reaction dynamics
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4. Atomic hydrogen-driven halogen extraction from silicon(100): Eley-Rideal surface kinetics
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