Use of neural network to in situ conditioning of semiconductor plasma processing equipment
Author:
Funder
Ministry of Education, Science and Technology
Publisher
Elsevier BV
Subject
Software
Reference17 articles.
1. Radio frequency diagnostics for plasma etch systems;Bushman;J. Electronchem. Soc.,1997
2. Ion energy analysis system, PLASMART™, User's Manual.
3. Radio frequency source power effect on silicon nitride films deposited by using a room temperature pulsed-PECVD;Kim;Thin Solid Films,2009
4. Monitoring of plasma processing chamber using ion energy analyzer and time series neural network;Kim;Surf. Eng.,2010
5. Fault detection of plasma etchers using optical emission spectra;Yue;IEEE Trans. Semicond. Manufact.,2000
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