Study on the mechanism of second phase formation in high-purity fused silica materials for semiconductor application-Reference-Cited by-同舟云学术

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Study on the mechanism of second phase formation in high-purity fused silica materials for semiconductor application

Published:2024-07 Issue: Volume:635 Page:122990
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Hu Zechen^ORCID,Yu Zhiguo,Zhao Tong,Ding Degong,Lv Xiang,Ji Yongsheng,Peng Lihua,Yang Deren,Yu Xuegong

Publisher

Elsevier BV

Reference28 articles.

1. Method of Making Quartz Glass crucibles, and Apparatus Carrying Out the Method;Habegger,1983

2. Quartz Glass Crucible For Pulling a Single Crystal;Hayashi,1994

3. Erosion of materials in molten silicon;Chaney;J. Electrochem. Soc.,1976

4. Investigation of gas bubble growth in fused silica crucibles for silicon Czochralski crystal growth;Hirsch;J. Cryst. Growth,2020

5. Reaction at the interface between Si melt and a Ba-doped silica crucible;Huang;J. Cryst. Growth,2005

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