Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams-Reference-Cited by-同舟云学术

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Structural and optical properties of the nc-Si:H thin films irradiated by high energetic ion beams

Published:2013-03 Issue: Volume:363 Page:13-19
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Goh Boon Tong,Ngoi Siew Kien,Yap Seong Ling,Wong Chiow San,Dee Chang Fu,Rahman Saadah Abdul

Funder

UM/MOHE High Impact Research Grant Allocation

University of Malaya Research Fund Assistance

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference76 articles.

1. Stability of hydrogenated nanocrystalline silicon thin-film transistors

2. Photo- and electroluminescence from nanocrystalline silicon single and multilayer structures

3. Improved luminescence properties of nanocrystalline silicon based electroluminescent device by annealing

4. The preparation of thin layers of Ge and Si by chemical hydrogen plasma transport

5. Material and solar cell research in microcrystalline silicon

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2. Growth of crystalline silicon by a seed layer approach using plasma enhanced chemical vapor deposition;Physica B: Condensed Matter;2021-05

3. Effect of Oxygen Concentration on the Structure and Optical Properties of SiO x Coatings;Surface Engineering and Applied Electrochemistry;2018-01

4. Ostwald ripening in segregated SixN/SiyN multilayers;physica status solidi (a);2016-06-29

5. Some Examples of Small Plasma Devices;Elements of Plasma Technology;2015-12-25

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