Characterization of HF-PECVD a-Si:H thin film solar cells by using OES studies-Reference-Cited by-同舟云学术

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Characterization of HF-PECVD a-Si:H thin film solar cells by using OES studies

Published:2011-01 Issue:1 Volume:357 Page:161-164
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Lien Shui-Yang,Chang Yin-Yu,Cho Yun-Shao,Wang Jui-Hao,Weng Ko-Wei,Chao Ching-Hsun,Chen Chia-Fu

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. a‐SiC:H/a‐Si:H heterojunction solar cell having more than 7.1% conversion efficiency

2. Microcrystalline n-i-p solar cells deposited at 10Å/s by VHF-GD

3. Gas phase kinetic and optical emission spectroscopy studies in plasma-enhanced hot filament catalytic CVD production of carbon nanotubes

4. High-pressure condition of SiH4+Ar+H2 plasma for deposition of hydrogenated nanocrystalline silicon film

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Programmable photovoltaic submodules for hotspot mitigation;International Journal of Sustainable Engineering;2023-05-03

2. Analysis, Synthesis and Characterization of Thin Films of a-Si:H (n-type and p-type) Deposited by PECVD for Solar Cell Applications;Materials;2021-10-24

3. Carbon Dioxide Tornado-Type Atmospheric-Pressure-Plasma-Jet-Processed rGO-SnO2 Nanocomposites for Symmetric Supercapacitors;Materials;2021-05-24

4. Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers;Nanomaterials;2021-04-29

5. Using optical emission spectroscopy (OES) to monitor In-line very high-frequency plasma enhanced chemical vapor deposition (VHF-PECVD) technique optoelectrical properties;2019 Compound Semiconductor Week (CSW);2019-05

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