Characterization of chromium silicide thin layer formed on amorphous silicon films-Reference-Cited by-同舟云学术

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Characterization of chromium silicide thin layer formed on amorphous silicon films

Published:2008-05 Issue:19-25 Volume:354 Page:2171-2175
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Caputo D.,de Cesare G.,Ceccarelli M.,Nascetti A.,Tucci M.,Meda L.,Losurdo M.,Bruno G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Characterization of amorphous silicides formed through interaction between a-Si:H and metals

2. Structural morphology and electronic properties of the Si-Cr interface

3. Multilayer color detectors;Palma,2000

4. .

5. Triple-junction amorphous silicon alloy solar cell with 14.6% initial and 13.0% stable conversion efficiencies

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1. Welding reinforcement between silica glass and stainless steel using nanosecond fiber laser with chromium interlayer;Optics and Lasers in Engineering;2024-01

2. Thin-Film-Based Multifunctional System for Optical Detection and Thermal Treatment of Biological Samples;Biosensors;2022-11-04

3. On the Stability of Amorphous Silicon Temperature Sensors;IEEE Transactions on Electron Devices;2020-08

4. XPS spectra of chromium monosilicides and disilicides obtained by in situ fractured clean surfaces;Surface and Interface Analysis;2020-06-24

5. Stability of Hydrogenated Amorphous Silicon Diodes as Thin Film Temperature Sensors;Lecture Notes in Electrical Engineering;2020

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