Growth and properties of chemical-vapor-deposited Ti–P–O films grown under the CO2- and H2-existing conditions
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Amorphous Cerium−Titanium Solid Solution Phosphate as a Novel Family of Band Gap Tunable Sunscreen Materials
2. Lithium Insertion into Titanium Phosphates, Silicates, and Sulfates
3. Influence of heat treatment and humidity on protonic conduction in sol-gel derived amorphous titanium phosphate films
4. Growth and Properties of TiCl4-Derived CVD Titanium Oxide Films at Different CO2/H2 Inputs
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Development of CVD Ti-containing films;Progress in Materials Science;2013-10
2. Atomic layer deposition of titanium phosphate on silica nanoparticles;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2012-01
3. Study on the Electrochemistry of a Na3[Ti2P2O10F]·xH2O-Modified Glassy Carbon Electrode;The Journal of Physical Chemistry C;2009-02-23
4. Amorphous TiPO films grown with four-component chemical vapor deposition;Materials Chemistry and Physics;2005-10
5. A Facile Layer-by-Layer Adsorption and Reaction Method to the Preparation of Titanium Phosphate Ultrathin Films;Chemistry of Materials;2005-06-01
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