Characterization of the density of states of polymorphous silicon films produced at 13.56 and 27.12 MHz using CPM and SCLC techniques-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Characterization of the density of states of polymorphous silicon films produced at 13.56 and 27.12 MHz using CPM and SCLC techniques

Published:2004-06 Issue: Volume:338-340 Page:206-210
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Raniero L.,Pereira L.,Zhang Shibin,Ferreira I.,Águas H.,Fortunato E.,Martins R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films

2. Very low densities of localized states at the Fermi level in hydrogenated polymorphous silicon from capacitance and space-charge-limited current measurements

3. Particle accumulation in a flowing silane discharge

4. Deep defect states in hydrogenated amorphous silicon studied by a constant photocurrent method

5. Hydrogenated Amorphous Silicon;Street,1991

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Amorphous InGaZnO and metal oxide semiconductor devices: an overview and current status;Journal of Materials Chemistry C;2019

2. Development of oxide based window and buffer layer for single junction amorphous solar cell: Reduction of light induced degradation;Materials Science in Semiconductor Processing;2014-08

3. Theoretical Study of the Electronic Properties of Silicon Nanocrystals Partially Passivated with Cl and F;The Journal of Physical Chemistry C;2012-02-02

4. Nanostructured Silicon Based Thin Film Transistors Processed in the Plasma Dark Region;Journal of Nanoscience and Nanotechnology;2010-04-01

5. Study on crystallization mechanism of hydrogenated silicon film;Acta Physica Sinica;2008

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3