Fluorinated nanoporous SiO2 films with ultra-low dielectric constant-Reference-Cited by-同舟云学术

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Fluorinated nanoporous SiO2 films with ultra-low dielectric constant

Published:2008-08 Issue:32 Volume:354 Page:3867-3870
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Zhen C.M.,Zhang J.J.,Zhang Y.J.,Liu C.X.,Pan C.F.,Hou D.L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Low dielectric constant materials for microelectronics

2. Preparation of low dielectric constant silicon containing fluorocarbon films by plasma enhanced chemical vapor deposition

3. Low dielectric constant materials

4. Moisture resistance and thermal stability of fluorine-incorporation siloxane-based low-dielectric-constant material

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