Influence of negative metal ion bombardment on the properties of ITO/PET films deposited by dc magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference13 articles.
1. Effect of Substrate Temperature on the Structural, Electrical and Optical Properties of ITO Films Prepared by RF Magnetron Sputtering
2. Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method
3. Characterization of transparent and conductive electrodes of indium tin oxide thin films by sequential reactive evaporation
4. Comparison of spray pyrolyzed FTO, ATO and ITO coatings for flat and bent glass substrates
5. Effect of secondary ion beam energy and oxygen partial pressure on the structural, morphological and optical properties of ITO films prepared by DMIBD technique
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1. Optical, structural, and electrical properties of modified indium-tin-oxide (ITO) films on glass surface by low energy ion implantation;Applied Physics A;2022-06-23
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3. Room temperature deposition of very thin and flexible crystalline ITO thin film using 3-D facing-magnetron sputtering plasma source;Vacuum;2021-11
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5. Characteristics of transparent indium zinc oxide electrode prepared on poly(ethylene naphthalate) by radio frequency magnetron sputtering for flexible dye-sensitized solar cells;Molecular Crystals and Liquid Crystals;2018-12-12
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