ArF laser induced pulse absorption in fused silica (type III): Modeling the fluence and repetition rate dependence
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference20 articles.
1. Mechanisms of radiation-induced defect generation in fused silica
2. Measuring small absorption losses of laser pulses in fused silica by a pump and probe technique
3. Novel method to measure bulk absorption in optically transparent materials
4. Characterization of low losses in optical thin films and materials
5. Generation and annealing of defects in virgin fused silica (type III) upon ArF laser irradiation: Transmission measurements and kinetic model
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Study of UV repetition laser-induced absorption on fused silica surface using a surface thermal lensing technique;Optics Letters;2020-04-14
2. Luminescence of α-quartz crystal and silica glass under excitation of excimer lasers ArF (193 nm), KrF (248 nm);Journal of Luminescence;2017-08
3. Repetition rate dependence of absorption of fused silica irradiated at 193 nm;Chinese Optics Letters;2013
4. Sensitive and absolute absorption measurements in optical materials and coatings by laser-induced deflection technique;Optical Engineering;2012-09-14
5. Rapid lifetime testing of fused silica for DUV laser applications;Journal of Non-Crystalline Solids;2011-04
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