Fabrication of amorphous silicon thin-film transistor by micro imprint lithography-Reference-Cited by-同舟云学术

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Fabrication of amorphous silicon thin-film transistor by micro imprint lithography

Published:2006-06 Issue:9-20 Volume:352 Page:1704-1707
ISSN:0022-3093
Container-title:Journal of Non-Crystalline Solids
language:en
Short-container-title:Journal of Non-Crystalline Solids

Author:

Choo Byoung-Kwon,Choi Jung-Su,Kim Se-Whan,Park Kyu-Chang,Jang Jin

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. High electron mobility transistors fabricated by nanoimprint lithography

2. Room-temperature Si single-electron memory fabricated by nanoimprint lithography

3. S.H. Kim, J.H. Hur, K.M. Kim, J. Jang, in: Proceedings of the First International TFT Conference (2005) 146.

4. 28.4: A Silver gate a-Si TFT with buffer layers for Large-Area AMLCDs

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