Author:
Coyle Richard J,Jon Min-Chung
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Biotechnology,Electronic, Optical and Magnetic Materials
Reference9 articles.
1. D.L. Lin, Thermal breakdown of VLSI by electrostatic discharge pulses, in: Proceedings of IEEE 28th Annual Reliability Physics Symposium, 1990, p. 281.
2. T.S. Speakman, A model for the failure of bipolar silicon integrated circuits subjected to electrostatic discharge, in: Proceedings of the IEEE 12th Annual Reliability Physics Symposium, 1974, p. 60.
3. J.M. Meek, J.D. Craggs (Eds.), Electrical Breakdown of Gases, Wiley, New York, 1978.
4. EOS/ESD Symposium Proceedings, ESD Association and IEEE 1979–1998.
5. B.D. Blaustein (Ed.), Chemical Reactions in Electrical Discharges, American Chemical Society, Washington, DC. 1969.
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