Nanofabrication on a Si surface by slow highly charged ion impact-Reference-Cited by-同舟云学术

Nanofabrication on a Si surface by slow highly charged ion impact

Published:2007-03 Issue:1 Volume:256 Page:543-546
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Tona Masahide,Watanabe Hirofumi,Takahashi Satoshi,Nakamura Nobuyuki,Yoshiyasu Nobuo,Sakurai Makoto,Terui Toshifumi,Mashiko Shinro,Yamada Chikashi,Ohtani Shunsuke

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference19 articles.

1. Interaction of slow multicharged ions with solid surfaces

2. Interaction of slow, very highly charged ions with surfaces

3. Highly charged ions

4. Oxide nanodots and ultrathin layers fabricated on silicon using nonfocused multicharged ion beams

5. Creation of nanodiamonds by single impacts of highly charged ions upon graphite

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