Free radical kinetics in a plasma immersion ion implanted polystyrene: Theory and experiment
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference42 articles.
1. Electron spin resonance studies of plasma-induced polystyrene radicals;Kuzuya;J. Polym. Sci., Part A: Polym. Chem.,1991
2. EPR kinetics in irradiated syndiotactic polystyrene at elevated temperatures;Lin;Polymer,2008
3. ESR study of pressure dependence of free-radical decay in irradiated polystyrene;Szocs;J. Polym. Sci., Polym. Phys. Ed.,1975
4. ESR investigations on irradiated polystyrene;Chipara;Nucl. Instrum. Meth. Phys. Res., Sect. B,2003
5. Photo-oxidation of polymers – 2. Photo-chain reaction of peroxide radicals in polystyrene;Kuzina;Eur. Polym. J.,1998
Cited by 61 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Response of variation of electrical control parameters to coatings prepared in organo-silicon electrolyte by plasma electrolytic oxidation;Ceramics International;2024-09
2. Protecting Orthopaedic Implants from Infection: Antimicrobial Peptide Mel4 Is Non-Toxic to Bone Cells and Reduces Bacterial Colonisation When Bound to Plasma Ion-Implanted 3D-Printed PAEK Polymers;Cells;2024-04-09
3. Polydimethylsiloxane surface irradiated by nitrogen ions: Influence of low molecular fractions;Journal of Vacuum Science & Technology A;2024-03-08
4. Durable plasma-mediated zwitterionic grafting on polymeric surfaces for implantable medical devices;Communications Materials;2024-03-05
5. Spectroscopic analysis of 1.75 MeV N5+ ions irradiated polystyrene film and the quest for the reaction mechanisms of fullerene and other products;Radiation Physics and Chemistry;2024-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3