Nanoscale metal-silicide films prepared by surfactant sputtering and analyzed by RBS
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference25 articles.
1. Influence of hydrogen plasma surface treatment of Si substrate on nickel silicide formation
2. Signatures of quantum transport in self-assembled epitaxialnickel silicide nanowires
3. Work function tuning of nickel silicide by co-sputtering nickel and silicon
4. Electronic, optical, and surface properties of PtSi thin films
5. Theoretical investigation ofPtSisurface energies and work functions
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