Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film-Reference-Cited by-同舟云学术

Comparison of PMMA shrinkage in ion beam lithography: PMMA on glass substrate vs free-standing PMMA film

Published:2023-05 Issue: Volume:538 Page:123-130
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Romanenko Oleksandr,Lavrentiev Vasily,Borodkin Andrei^ORCID,Havranek Vladimir,Mackova Anna^ORCID

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference18 articles.

2. Deep light ion lithography in PMMA - A parameter study;Schrempel;Nucl. Instruments Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms.,1997

4. MeV ion beam lithography of biocompatible halogenated Parylenes using aperture masks;Whitlow;Nucl. Instruments Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms.,2015

5. Application of stencil masks for ion beam lithographic patterning;Brun;Nucl. Instruments Methods Phys. Res. Sect. B Beam Interact. Mater. Atoms.,2013

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