MeV ion exposure behaviour of PMMA resist polymer studied by synchrotron light spectroscopies-Reference-Cited by-同舟云学术

MeV ion exposure behaviour of PMMA resist polymer studied by synchrotron light spectroscopies

Published:2017-08 Issue: Volume:404 Page:238-242
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Norarat Rattanaporn,Jainontee Karuna,Thianthaisong Wanlapaporn,Sriwang Sukonlaphat,Nakajima Hideki,Chienthavorn Orapin,Guibert Edouard,Whitlow Harry J.

Funder

University Researcher

Rajamangala University of Technology Lanna

Center of Excellent for Innovation in Chemistry

Office of the Higher Education Commission

Ministry of Education

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference23 articles.

1. Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating;Gorelick;Nanotechnology,2010

2. PMMA as an X-ray resist for micro-machining application: latent image formation and thickness losses;Vladimirsky;Microelectron. Eng.,1996

3. Electroforming of Ni mold for imprint lithography using high-aspect-ratio PMMA microstructures fabricated by proton beam writing;Tanabe;Microelectron. Eng.,2011

4. Ni electroplating on a resist micro-machined by proton beam writing;Uchiya;Microsyst. Technol.,2008

5. Resist materials for proton beam writing: a review;van Kan;Appl. Surf. Sci.,2014

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