Analysis of depth redistribution of implanted Fe near SiO2/Si interface
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference11 articles.
1. Growth of single-walled carbon nanotubes from hot-implantation-formed catalytic Fe nanoparticles assisted by microwave plasma
2. Characterization of Hot-Implanted Fe near the SiO2/Si Interface
3. Carbon Nanotube Synthesis Structures and Applications;Dresselhaus,2001
4. Microstructure and electrical properties of Sn nanocrystals in thin, thermally grown SiO2 layers formed via low energy ion implantation
5. Silver nanoparticle formation in thin oxide layer on silicon by silver-negative-ion implantation for Coulomb blockade at room temperature
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Evolution of implanted Fe ions in SiO2/Si wafer into uniformly sized catalyst particles for carbon nanotube forest growth;Carbon;2017-10
2. Investigation of Intermixing/Implantation in Pulsed Laser Deposited Metallic Cr/Ni80Fe20 and Ni80Fe20/Polypyrrole Multilayer Thin Films;Lasers in Manufacturing and Materials Processing;2016-10-22
3. Structural and gas sensing properties of ex-situ oxidized Sn grown by thermal evaporation;Applied Surface Science;2016-01
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