Sputtering and crystalline structure modification of bismuth thin films deposited onto silicon substrates under the impact of 20

Sputtering and crystalline structure modification of bismuth thin films deposited onto silicon substrates under the impact of 20–160keV Ar+ ions

Published:2010-01 Issue:2 Volume:268 Page:140-148
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Mammeri S.,Ouichaoui S.,Ammi H.,Zemih R.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference48 articles.

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4. Experimental evidence of the irradiation temperature effect in bismuth under swift heavy-ion irradiation

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