Operational limit of a planar DC magnetron cluster source due to target erosion
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference20 articles.
1. Numerical study of the sputtering in a dc magnetron
2. The influence of target erosion on the mass spectra of clusters formed in the planar DC magnetron sputtering source
3. Cluster–surface interaction: From soft landing to implantation
4. Magnetron discharges for thin film deposition;Ellmer,2008
5. Mass spectrometric investigations of nano-size cluster ions produced by high pressure magnetron sputtering;Ganeva;Contrib. Plasma Phys.,2012
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