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2. Requirements and challenges in ion implanters for sub-100nm CMOS device fabrication;Jeong,2003
3. Experimental and simulation studies of the channeling phenomena for high energy implantation;Guo,2003
4. Channeling doping profiles studies for small incident angle implantation into silicon wafers;Guo,2003
5. Effect of tilt angle variations in a halo implant on Vth values for 0.14μm CMOS devices;Santiesteban;IEEE Transactions on Semiconductor Manufacturing,2003