Cluster induced chemistry at solid surfaces: Molecular dynamics simulations of keV C60 bombardment of Si

Author:

Krantzman K.D.,Kingsbury D.B.,Garrison Barbara J.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Cited by 30 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Convenient Way to Create an MD Model of a Hot Crystal with an Open Surface;2022 International Conference on Electrical Engineering and Photonics (EExPolytech);2022-10-20

2. Physical Mechanisms of SiO$_{2}$ Target Sputtering with Accelerated Ions of C$_{60}$;METALLOFIZIKA I NOVEISHIE TEKHNOLOGII;2016-08-17

3. Computer study of the removal of Cu from the graphene surface using Ar clusters;Computational Materials Science;2015-02

4. Controllable fabrication of amorphous Si layer by energetic cluster ion bombardment;Vacuum;2013-12

5. Molecular Depth Profiling with Cluster Ion Beams;Cluster Secondary Ion Mass Spectrometry;2013-04-15

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