1. Improving the quality of epitaxial foils produced using a porous silicon-based layer transfer process for high efficient thin-film crystalline silicon solar cells;Radhakrishnan;IEEE Journal of Photovoltaics,2014
2. Epitaxial Growth of High Quality n-type Silicon Foils in a Quasi-inline APCVD Reactor;Milenkovic;Energy Procedia,2015
3. Kobayashi E, Watabe Y, Hao R, Ravi TS. Efficient heterojunction solar cells on n-type epitaxial kerfless Silicon Wafers. Presented at the 31st European PV Solar Energy Conference and Exhibition, Hamburg, Germany, 2015.
4. Reber S, Pocza D, Keller M, Arnold M, Schillinger N, Krogull D. Advances in equipment and process development for high-throughput continuous silicon epitaxy. Presented at the 27th European PV Solar Energy Conference and Exhibition, Frankfurt, Germany, 2012.
5. Reber S, Haase C, Schillinger N, Bau S, and Hurrle A. The RTCVD160 - a new lab-type silicon CVD processor for silicon deposition on large area substrates. Presented at the 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 2003.