1. S. Narasimha and A. Rohatgi, “Optimized Al back surface field techniques for Si solar cells” in: Proceedings 26th IEEE, PVSC, Anaheim, USA, 1997, p. 63.
2. S. Peters, “Rapid Thermal Processing of Crystalline Silicon Materials and Solar Cells”, Ph.D. thesis, University Konstanz, 2004, p. 62.
3. A. W. Blakers, A. Wang, M. Adele, J. Zhao, and M. A. Green, “22.8% efficient silicon solar cell”, Appl. Phys. Lett. 55, 1989, p. 1363.
4. I. Martín, M. Vetter, A. Orpella, J. Puigdollers, A. Cuevas, and R. Alcubilla, “Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films”, Appl. Phys. Lett. 79, 2001, p. 2199.
5. M. Hoffmann, S. Kambor, C. Schmidt, D. Grambole, J. Rentsch, S. Glunz, and R. Preu, “Firing stable surface passivation using all-PECVD stacks of SiOx:H and SiNx:H”, in: Proceedings 22nd EUPVSEC, Milano, Italy, 2007, p. 1030.